Description
的測試結(jié)果優(yōu)于標(biāo)準(zhǔn)。準(zhǔn)確分析100 nm至40 µm過濾面罩效率。 SARS-CoV-2尺寸約120 nm-160 nm。8個(gè)尺寸通道可支持100 nm和180 nm測試。
? 試驗(yàn)臺(tái)工作原理優(yōu)于GB 2626,EN 143,EN 149和EN 13274-7
? 測試分?jǐn)?shù)效率,例如100 nm至40 µm整個(gè)尺寸范圍內(nèi)的效率
? 我們共有8個(gè)尺寸通道,在100nm至180 nm之間的尺寸范圍內(nèi),準(zhǔn)確分析SARS-CoV-2(尺寸約120 nm至160 nm)的過濾器和過濾面罩效率
? 面向未來:無需調(diào)整即可與任何類型的氣霧劑一起使用
? 進(jìn)一步測量壓差,例如,支持多種不同的面部流速
? 面部流速可在1.5-50cm/s之間調(diào)節(jié)
? 能夠快速保證質(zhì)量并在研發(fā)中不斷優(yōu)化的產(chǎn)品(顯示尺寸分布)
? 適用于您產(chǎn)品的獨(dú)立面罩適配器
? 有吸引力的2年維護(hù)包,可提供測試設(shè)備
PMFT 1000基于Palas®MFP 1000。
圖為:冠狀病毒過濾器和過濾面罩效率分析,根據(jù)標(biāo)準(zhǔn)進(jìn)行的氣溶膠測試尺寸分布如下:
石油:Geom。標(biāo)準(zhǔn)差1,8 |直徑中值:301 nm
圖為:DEHS尺寸分布
NaCl:Geom標(biāo)準(zhǔn)差2,1 |直徑中值:63nm
圖為:NaCl尺寸分布
Overview of standards for face mask penetration testing
EN 149 | EN 13274-7 | EN 13274-7 | GB 2626 | GB 2626 | 42 CFR 84 | 42 CFR 84 | |
---|---|---|---|---|---|---|---|
Aerosol | see EN 13274-7 | NaCl | PaO | NaCl | PaO/DOP | NaCl | DOP |
Mean diameter | see EN 13274-7 | 0.06 – 0.1 µm | 0.29 – 0.45 µm | 0.055 – 0.095 µm | 0.165 – 0.205 µm | 0.055 – 0.095 µm | 0.165 – 0.205 µm |
Standard deviation | see EN 13274-7 | 2 – 3 | 1.6 – 2.2 | < 1.86 (by additional software module) | < 1.6 (by additional software module) | < 1.86 (by additional software module) | < 1.6 (by additional software module) |
Concentration | see EN 13274-7 | 4 –12 mg/m3 | 15 – 25 mg/m3 | < 200 mg/m3 | (50 mg/m3) < 200 mg/m3 | < 200 mg/m3 | < 200 mg/m3 |
Discharge | – | – | – | required | required | required | required |
Air flow | see EN 13274-7 | 95 l/min | 95 l/min | 85 ± 4 l/min | 85 ± 4 l/min | 85 ± 4 l/min | 85 ± 4.25 l/min |
Temperature | see EN 13274-7 | 22 ± 3 °C | – | 25 ± 5 °C | 25 ± 5 °C | 25 ± 5 °C | 25 ± 5 °C |
Rel. humidity | see EN 13274-7 | < 40 % | – | 20 – 40 % (by compressed air) | – | 20 – 40 % (by compressed air) | 20 – 40 % (by compressed air) |
Measurement device | see EN 13274-7 | Sodium flame photometer | Light scattering photometer | particle detector | particle detector | Light scattering photometer | Light scattering photometer |
Measuring time | see EN 13274-7 | 30 s | 30 s | lowest eff. during loading | lowest eff. during loading | lowest eff. during loading | lowest eff. during loading |
Pause time | see EN 13274-7 | 180 s | 180 s | lowest eff. during loading | lowest eff. during loading | lowest eff. during loading | lowest eff. during loading |
Exposition | 120 mg | 120 mg | 120 mg | 200 ± 5 mg | 200 ± 5 mg | 200 ± 5 mg | 200 ± 5 mg |
PMFT remarks | O.K. | O.K. | O.K. | O.K. with upgrade KIT | O.K. with upgrade KIT | O.K. with upgrade KIT | O.K. with upgrade KIT |