智能型PECVD系統(tǒng)（含壓力控制系統(tǒng)）/Intelligent PECVD system with pressure control system-安徽貝意克設(shè)備技術(shù)有限公司

Intelligent PECVD equipment is the latest type of equipment at present, which integrates all control parts into one. This kind of equipment is patented by our company in 2013.

智能PECVD設(shè)備是目前型的一款設(shè)備，將所有的控制部分集為一體，此款設(shè)備是我司在2013年獲得的設(shè)備.

Can be equipped with PE RF power supply, CVD system upgrade to PECVD.

可配備PE射頻電源，將CVD系統(tǒng)升級(jí)為PECVD.

When the atmosphere involved in the reaction enters the furnace tube under the action of radio frequency power to produce the ionizer, the reaction can be more adequate.

當(dāng)參與反應(yīng)的氣氛進(jìn)入爐管在射頻電源的作用下產(chǎn)生離子體，可使反應(yīng)更加充分.

At the same time, plasma plays an enhanced role, thus optimizing the technological conditions of the experiment to a great extent.

同時(shí)等離子體起增強(qiáng)的作用，從而很大程度上優(yōu)化實(shí)驗(yàn)的工藝條件.

The slide track PECVD system developed by our company can make the entire experimental chamber in the glow generation area.

我公司研制的滑軌式PECVD系統(tǒng)能使整個(gè)實(shí)驗(yàn)腔體都處于輝光產(chǎn)生區(qū).

The glow is uniform and equivalent, and this technique can solve the unstable state of traditional plasma.

輝光均勻等效，這種技術(shù)很好的解決了傳統(tǒng)等離子工作不穩(wěn)定狀態(tài).

In this way, the range and strength of ionization is one hundred times that of traditional PECVD, and the uneven accumulation of materials can be solved.

這樣離子化的范圍和強(qiáng)度是傳統(tǒng)PECVD的百倍，并解決了物料不均勻堆積現(xiàn)象.

Compared with traditional CVD system, the growth temperature is lower.

與傳統(tǒng)CVD系統(tǒng)比較，生長(zhǎng)溫度更低.

Use slide furnace to achieve rapid heating and cooling.

使用滑軌爐實(shí)現(xiàn)快速升溫和降溫.

The patented technology makes the whole tube glow uniform, equivalent, uniform growth.

設(shè)備的技術(shù)使得整管輝光均勻等效，均勻生長(zhǎng).

①High deposition rate: radiofrequency glow technology greatly improves the deposition rate of the film, which can reach 10A /S.

薄膜沉積速率高：射頻輝光技術(shù)，大大的提高了薄膜的沉積速率，沉積速率可達(dá)10Å/S.

②High uniformity of large area: advanced multi-point RF feed technology, special gas distribution and heating technology is adopted, which makes the uniformity index of the film reach 8%.
大面積均勻性高：采用了*的多點(diǎn)射頻饋入技術(shù)，特殊氣路分布和加熱技術(shù)等，使得薄膜均勻性指標(biāo)達(dá)到8%.

③High consistency: With the advanced design concept of the semiconductor industry, the deviation between the substrate at one deposition is less than 2%.
一致性高：用半導(dǎo)體行業(yè)的*設(shè)計(jì)理念，使得一次沉積的各基片之間偏差低于2%.

④High process stability: highly stable equipment to ensure the continuity and stability of the process.
工藝穩(wěn)定性高：高度穩(wěn)定的設(shè)備保證了工藝的連續(xù)和穩(wěn)定.

⑥Patent No.: ZL.0 (patented product, anti-counterfeiting must be investigated).
號(hào)：ZL.0 （產(chǎn)品，防偽必究）.

Single temperature zone heating system

單溫區(qū)加熱系統(tǒng)

Power supply

電源

The input voltage is single-phase 220V. 50/60 HZ

輸入電壓為單相、220V、50Hz

Rated powe 3kw

額定功率 3kw

Maximum temperature

溫度

1200℃

Temperature of service

使用溫度

≤1100℃

Temperature Controller

控溫方式

30 sections can be programmed temperature control, PID parameter self-tuning

30段可編程控溫，PID參數(shù)自整定

Operation interface for 10 "industrial computer, built-in PLC control program

操作界面為10”工控電腦，內(nèi)置PLC控制程序

The temperature control system and slide furnace sliding (time and distance) can be set as program control

可將溫控系統(tǒng)、滑軌爐滑動(dòng)（時(shí)間和距離）設(shè)定為程序控制

Heating Zone

加熱

Heating Zone Length:440mm

加熱區(qū)長(zhǎng)度：440mm

Constant Temperature Zone: 200mm

恒溫區(qū)長(zhǎng)度：200mm

Temperature Accuracy: +/- 1℃.

控溫精度：+/- 1℃

Effective furnace size

爐膛有效尺寸

Ф60*1650mm

Heating Elements

加熱元件

Resistance wire, Fe-Cr-Al Alloy doped by Mo

電阻絲（摻鉬鐵鉻鋁合金）

Type K thermocouple

K型熱電偶

Furnace chamber material

爐膛材料

Alumina, high temperature fiber products

氧化鋁、高溫纖維制品

PE radio frequency power supply

PE射頻電源

The CVD system can be equipped with PE RF power supply to upgrade the CVD system to PECVD. When the atmosphere involved in the reaction enters the furnace tube under the action of radio frequency power to produce the ionizer, the reaction can be more adequate. At the same time, plasma plays an enhanced role, thus optimizing the technological conditions of the experiment to a great extent.

該CVD系統(tǒng)可配備PE射頻電源，將CVD系統(tǒng)升級(jí)為PECVD。當(dāng)參與反應(yīng)的氣氛進(jìn)入爐管在射頻電源的作用下產(chǎn)生離子體，可使反應(yīng)更加充分。同時(shí)等離子體起增強(qiáng)的作用，從而很大程度上優(yōu)化實(shí)驗(yàn)的工藝條件。

Frequency of signal

信號(hào)頻率

13.56 MHz±0.005%

Power output range

功率輸出范圍

500W

Rf output interface

射頻輸出接口

50 Ω, N-type, female

Stability of power

功率穩(wěn)定度

±0.1%

Component of harmonic wave諧波分量

≤-50dbc

Supply voltage

供電電壓

Single-phase AC (187V-253V) frequency 50/60 Hz

單相交流（187V-253V）頻率50/60HZ

Efficiency of whole machine

整機(jī)效率

>=70%

Factor of power

功率因素

>=90%

Mode of cooling

冷卻方式

Forced air cooling

強(qiáng)制風(fēng)冷

Five-way proton flow control system

五路質(zhì)子流量控制系統(tǒng)

The gas supply system can control the mixing ratio of four kinds of gas according to different flow rates, and can also be equipped with gas washing device according to the experimental requirements. The mass flowmeter is installed in the sealed movable cabinet, which is composed of super clean double cast stainless steel pipe and precision double card sleeve joint, and is controlled by touch screen.

供氣系統(tǒng)是一種可控制4種氣體按不同流量進(jìn)行混合配比，也可根據(jù)實(shí)驗(yàn)需求加裝洗氣裝置，質(zhì)量流量計(jì)安裝于密封的可移動(dòng)機(jī)柜內(nèi)，由超潔雙拋不銹鋼管與精密雙卡套接頭連接組成，觸摸屏控制。

Connection header type

連接頭類型

Double sleeve stainless steel connector

雙卡套不銹鋼接頭

Standard range

標(biāo)準(zhǔn)量程

氬氣：1000sccm

氫氣：300sccm

甲烷：100sccm

氮?dú)猓?/font>500sccm

氧氣：100scc

Accuracy

準(zhǔn)確度

±1.5%

Linear

線性

±0.5～1.5%

Repetition accuracy

重復(fù)精度

±0.2%

Response time

響應(yīng)時(shí)間

Gas characteristics: 1 ~ 4 Sec, electrical characteristics: 10 Sec

氣特性：1～4 Sec，電特性：10 Sec

Working pressure difference range

工作壓差范圍

0.1～0.5 MPa

Maximum pressure

壓力

3MPa

Interface

接口

Φ6 or 1/4 "is optional

Φ6或者1/4''可選

Display

顯示

4-digit display

4位數(shù)字顯示

Operating ambient temperature

工作環(huán)境溫度

5~45 high purity gas

5~45高純氣體

Pressure vacuum gauge

壓力真空表

-0.1 ~ 0.15MPa, 0.01MPa/grid

－0.1～0.15 MPa, 0.01 MPa/格

Vacuum machine set

真空機(jī)組

The vacuum unit is internally equipped with a bipolar rotary vane mechanical pump, a set

of capacitance vacuum gauge, and supporting corrugated pipes, manual flapper valves, clamps

ａnd other connecting parts. The cold limit vacuum of the equipment can reach 0.5Pa.

真空機(jī)組，內(nèi)部安裝雙極旋片機(jī)械泵1臺(tái)，電容真空計(jì)1套，并含有配套使用的波紋管，手動(dòng)擋板閥，卡箍等連接部件。設(shè)備冷態(tài)極限真空可達(dá)0.5Pa。

Operating voltage

工作電壓

220V±10% 50~60HZ

Power

功率

1KW

Rate of air extraction

抽氣速率

16m³/h

Ultimate vacuum

極限真空

0.5Pa

Air inlet diameter

進(jìn)氣口口徑

KF25

Exhaust port diameter

排氣口口徑

KF25

Mode of connection

連接方式

The bellows are used, and the manual flapper valve is connected with the bellows

采用波紋管，手動(dòng)擋板閥與波紋管相連

Capacitance vacuum gauge

電容真空計(jì)

ZDM-I(with communication), can communicate with the touch screen

ZDM-I(帶通訊），可以和觸摸屏通訊上

Vacuum gauge measuring range is optional from 5-5000pa

真空規(guī)管測(cè)量范圍可選5-5000pa

There is no need for coefficient conversion due to different gas types

不需因測(cè)量氣體種類不同而需要系數(shù)轉(zhuǎn)換

With high accuracy and repeatability, the response time is short

具有較高的精確度和重復(fù)性，響應(yīng)時(shí)間較短

Pressure control system

壓力控制系統(tǒng)

Main components

主要部件

Butterfly valve, pressure controller, capacitance vacuum gauge composition

蝶閥、壓力控制器、電容真空計(jì)組成

Effect

作用

According to the experimental requirements, add a butterfly valve (regulating valve) and a vacuum gauge between the outlet and the pump
根據(jù)實(shí)驗(yàn)要求，在出氣端和泵之間增加蝶閥（調(diào)節(jié)閥）和真空計(jì)

The vacuum gauge can detect the pressure in the pipe and adjust the opening size of the butterfly valve (regulator valve) through PLC

真空計(jì)可檢測(cè)管內(nèi)壓力，通過 PLC 調(diào)節(jié)蝶閥（調(diào)節(jié)閥）開啟的大小

To achieve the control pipe pressure unchanged

以達(dá)到控制管內(nèi)壓力不變

Range of pressure

壓力范圍

100~100000Pa

Precision of control

控制精度

The measured value is ±5%

測(cè)量值±5%